| 摘要 |
The invention relates to a multiple beam charged particle optical system, comprising an electrostatic lens structure with at least one electrode, provided with apertures, wherein the effective size of a lens field effected by said electrode at a said aperture is made ultimately small. The system may comprise a diverging charged particle beam part, in which the lens structure is included. The physical dimension of the lens is made ultimately small, in particular smaller than one millimeter, more in particular less than a few tens of micrometers. In further elaboration, a lens is combined with a current limiting aperture (CLA), aligned such relative to a lens of said structure, that a virtual aperture (VA) effected by said current limiting aperture in said lens is situated in an optimum position with respect to minimizing aberrations total. |
