发明名称 |
Method of nano-patterning using surface plasmon effect and method of manufacturing a discrete track magnetic recording media using the nano-patterning method |
摘要 |
A method of nano-patterning, a method of manufacturing a nano-imprinting master and a discrete track magnetic recording medium are all provided. The method of nano-patterning includes (a) sequentially forming on a substrate an etching object material layer, a photoresist layer, and a metal layer patterned to a first pattern having a structure in which line patterns are repeatedly arranged with a predetermined interval ; (b) irradiating light onto a surface of the metal layer to excite surface plasmon so that the photoresist layer is exposed to a second pattern by the surface plasmon; (c) removing the metal layer and developing the photoresist layer; and (d) etching the etching object material layer using the photoresist layer patterned to the second pattern as a mask. |
申请公布号 |
EP2045659(A1) |
申请公布日期 |
2009.04.08 |
申请号 |
EP20080161946 |
申请日期 |
2008.08.06 |
申请人 |
SAMSUNG ELECTRONICS CO., LTD. |
发明人 |
KIM, HAE-SUNG;LEE, MYUNG-BOK;SOHN, JIN-SEUNG |
分类号 |
G03F1/00;B29C59/02;B82B3/00;B82Y10/00;B82Y40/00;G03F7/20;G11B5/855;H01L21/027 |
主分类号 |
G03F1/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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