摘要 |
The invention relates to a cyclic 2,3-addition polymer obtained from a monomer composition consisting of one or more polycyclic monomers having a pendant aromatic substituent, in combination with a monomer selected from the group consisting of one or more polycyclic monomers having a pendant acid labile substituent. The invention further relates to a photoresist composition comprising a photoacid initiator, an optional dissolution inhibitor, and said cyclic 2,3-addition polymer.
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申请人 |
SUMITOMO BAKELITE CO., LTD.;INTERNATIONAL BUSINESS MACHINES CORPORATION |
发明人 |
JAYARAMAN, SAIKUMAR;GOODALL, BRIAN L.;RHODES, LARRY F.;SHICK, ROBERT A.;VICARI, RICHARD;ALLEN, ROBERT D.;OPITZ, JULIANN;SOORIYAKUMARAN, RATNAM;WALLOW, THOMAS |