LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD

摘要

A manufacturing method of device and a lithography apparatus are provided to control the position related quantity of objects such as speed or acceleration. The measuring system measures location or the position related quantity of the objects. The controller(4) provides the control signal based on the measured location or the position related quantity. The actuator(5) operates the objects based on the control signal. The measured location or the position related quantity is filtered from the filter unit. The filter unit is the partial order filter unit. The controller can be the integrator control unit.