Substrate carrying apparatus, exposure apparatus, and device manufacturing method

摘要

A substrate carrying apparatus, comprises: a first carrying mechanism that carries a substrate into an exposure processing unit that performs exposure processing via a projection optical system and a liquid; a second carrying mechanism that carries a substrate from the exposure processing unit; and an anti-scattering mechanism that controls scattering of the liquid from at least one of the second carrying mechanism and the substrate carried by the second carrying mechanism to at least one of the first carrying mechanism and the substrate carried by the first carrying mechanism.