发明名称 |
Reticle with antistatic coating |
摘要 |
A static resistant reticle comprises a substrate and a patterning layer and is covered by an antistatic conductive film of quaternary amine (R4N)+Cl-. A pellicle structure comprising an optically transparent membrane tightly stretched on a frame is also coated by an antistatic electro conductive film of a similar material. The reticle with the pellicle form a shielded structure isolating the reticle from ESD.
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申请公布号 |
US7514184(B2) |
申请公布日期 |
2009.04.07 |
申请号 |
US20050092734 |
申请日期 |
2005.03.28 |
申请人 |
TAIWAN SEMICONDUCTOR MANUFACTURING CO. |
发明人 |
SU WEI-YU;CHENG DONG-HSU;TURN LI-KONG |
分类号 |
G03F1/00;A47G1/12;B44F1/00;G03F1/14;G03F9/00;G03G16/00 |
主分类号 |
G03F1/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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