| 摘要 |
A chemical solution mixing supply apparatus is provided to supply the chemical solution of very small amount to the mixing portion through the chemical supplying unit and to control the supply quantity of the chemical solution and concentration of the composition slurry. The apparatus for supplying chemical source comprises the tank, and the chemical supplying unit(100) and the mixing portion(200). The tank accommodates the chemical solution(C1) of very small amount and is provided with the gas(G). The chemical supplying unit pushes the chemical solution within the tank by the pressure of the gas and completely discharges the chemical solution to the outside of the tank. The mixing portion is connected to the chemical supplying unit. The mixing portion is provided with the ejected chemical solution. The mixing portion mixes the chemical solution and the other chemical solution(C2).
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