| 发明名称 |
High pressure processing method and apparatus |
| 摘要 |
Disclosed is a high pressure processing method for subjecting a processing object to a high pressure processing using a high pressure fluid. In this method, the high pressure fluid is brought into collision with the surface of the processing object placed in a high pressure processing chamber, and then distributed along the surface of the processing object in an outward direction beyond the processing object.
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| 申请公布号 |
US7513265(B2) |
申请公布日期 |
2009.04.07 |
| 申请号 |
US20030688889 |
申请日期 |
2003.10.21 |
| 申请人 |
KABUSHIKI KAISHA KOBE SEIKO SHO;DAINIPPON SCREEN MFG. CO., LTD. |
发明人 |
YOSHIKAWA TETSUYA;INOUE YOICHI;WATANABE KATSUMI;MASUDA KAORU;IIJIMA KATSUYUKI;IWATA TOMOMI;MURAOKA YUSUKE;SAITO KIMITSUGU;MIZOBATA IKUO |
| 分类号 |
B08B6/00;B08B7/00;C25F1/00;G03F7/00;H01L21/00;H01L21/302;H01L21/304 |
主分类号 |
B08B6/00 |
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