| 摘要 |
An exposure apparatus exposes a substrate by illuminating a pattern with an exposure beam and transferring an image of the pattern through a liquid onto the substrate. The exposure apparatus includes a projection optical system which projects the image of the pattern onto the substrate. In addition, a liquid immersion unit fills, with the liquid, at least a part of a space between the projection optical system and the substrate. A conditional expression (v.d.rho)/mu<=2,000 is satisfied, in which d represents a thickness of the liquid, v represents a velocity of a flow of the liquid between the projection optical system and the substrate, rho represents a density of the liquid, and mu represents a coefficient of viscosity of the liquid.
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