| 摘要 |
Provided is an alignment method including: forming an alignment film on a substrate; irradiating an ion beam onto the alignment film using a bar-type ion gun; and cleaning a surface of the substrate having the alignment film. The irradiating of an ion beam satisfies the following equation: 1.6x10-4<=(LgxIxT)/Ls<=1.6x10-2, where I is an ion beam current (A) measured outside an ion beam outlet and irradiated from the bar-type ion gun, Lg is a length (cm) of the ion beam outlet with respect to a moving direction of the substrate, Ls is a length (cm) of the substrate in the moving direction of the substrate, and T is a process time (sec) for processing one substrate.
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