发明名称 Process for the plasma cleaning of a component
摘要 Cracks are conventionally difficult to clean which often leads to damage to other regions of the component for cleaning. According to the invention, a plasma cleaning method is used, whereby a pressure and/or a separation of an electrode to the component are varied, in order to achieve a plasma cleaning in the crack.
申请公布号 US7513955(B2) 申请公布日期 2009.04.07
申请号 US20050591512 申请日期 2005.02.09
申请人 SIEMENS AKTIENGESELLSCHAFT 发明人 KRUEGER URSUS;REICHE RALPH;STEINBACH JAN
分类号 B08B3/12;B08B6/00;B08B7/00;B08B7/02;C23G5/00 主分类号 B08B3/12
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