发明名称 |
Process for the plasma cleaning of a component |
摘要 |
Cracks are conventionally difficult to clean which often leads to damage to other regions of the component for cleaning. According to the invention, a plasma cleaning method is used, whereby a pressure and/or a separation of an electrode to the component are varied, in order to achieve a plasma cleaning in the crack.
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申请公布号 |
US7513955(B2) |
申请公布日期 |
2009.04.07 |
申请号 |
US20050591512 |
申请日期 |
2005.02.09 |
申请人 |
SIEMENS AKTIENGESELLSCHAFT |
发明人 |
KRUEGER URSUS;REICHE RALPH;STEINBACH JAN |
分类号 |
B08B3/12;B08B6/00;B08B7/00;B08B7/02;C23G5/00 |
主分类号 |
B08B3/12 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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