| 摘要 |
A plasma processing apparatus and a driving method thereof are provided to minimize the addition of power supply units by supplying the power to the plurality of electrodes alternatively through a relay unit. A chamber(100) has a reaction space. An electrode unit(200,300) includes a plurality of electrodes for generating the plasma in an empty space. A power supply unit(400) supplies the power to the electrode unit. The power supply unit generates one power and supplies the power to the plurality of electrodes alternatively. The power supply unit includes a power generating unit and a relay unit. The power generating unit generates the power for generating the plasma. The relay unit provides the power to the plurality of electrodes alternatively. |
