发明名称 RESIN BLACK MATRIX, LIGHT BLOCKING PHOTOSENSITIVE RESIN COMPOSITION, TFT ELEMENT SUBSTRATE AND LIQUID CRYSTAL DISPLAY DEVICE
摘要 <P>PROBLEM TO BE SOLVED: To provide a highly reliable resin black matrix which has sufficient light blocking characteristics, suppresses temperature rise due to heat generated by a TFT element and does not have failures of a TFT element substrate and fluctuation in liquid crystal drive. <P>SOLUTION: The maximum light transmittance of the resin black matrix in a wavelength range of 400 nm to 700 nm is permitted to be not more than 1%, and the average light transmittance in a wavelength range of 850 nm to 3,000 nm to be not less than 60%. Alternatively, the minimum light transmittance is permitted to be not less than 50%. <P>COPYRIGHT: (C)2009,JPO&INPIT
申请公布号 JP2009069822(A) 申请公布日期 2009.04.02
申请号 JP20080211886 申请日期 2008.08.20
申请人 MITSUBISHI CHEMICALS CORP 发明人 TOSHIMITSU ERIKO;HIROTA TAKAO;KADOWAKI MASAMI
分类号 G02B5/00;G02B5/20;G02F1/1335;G03F7/004;G03F7/027;G03F7/031 主分类号 G02B5/00
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