PLASMA PROCESSING APPARATUS AND GAS EXHAUST METHOD

摘要

A plasma processing apparatus is provided for performing plasma processing to a substrate to be processed. The plasma processing apparatus is provided with a processing container (2) which forms an internal space (15); a substrate placing table (3) arranged in the internal space (15) for placing the substrate (W); a processing space forming member (16), which is arranged in the internal space (15), has the inner diameter (a1) smaller than the inner diameter (a15) of the internal space (15), and partitions a processing space (1) above the substrate placing table (3) for performing plasma processing; and an exhaust port (6) arranged between an upper end portion (16a) of the processing space forming member (16) and an inner wall (15a) of the internal space (15) for exhausting gas from the processing space (1).