<P>PROBLEM TO BE SOLVED: To prevent the deterioration of the optical performance of an optical system by efficiently removing scattering particles. <P>SOLUTION: This scattering particle removing device removing scattering particles generated by plasma generation is provided with an electrode plate arranged in an optical path of EUV light radiated from plasma and a voltage applying part which is installed outside the optical path of EUV light and applies a positive voltage or a negative voltage to the electrode plate. The electrode plate is disposed to cross the optical path of EUV light. <P>COPYRIGHT: (C)2009,JPO&INPIT
