| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a positive photosensitive lithographic printing plate material having scratch resistance which meets the demand for high productivity in a large plate, and excelling in development latitude to a developer of low pH or an exhausted low-activity developer, and a method for producing a positive lithographic printing plate using the same. <P>SOLUTION: The positive photosensitive lithographic printing plate material has an undercoat layer and a photosensitive layer containing an alkali-soluble resin on a substrate, wherein the undercoat layer contains a polymer component having a monomer component content of 0.01-10 mol%, and the alkali-soluble resin has at least one covalent bond unit and at least one heat reversible non-covalent bond unit, each non-covalent bond unit having a unit containing two or more bonds with a central hydrogen atom, the alkali-soluble resin has a weight average molecular weight of <10,000, and the hydrogen atoms of phenolic hydroxyl groups are not substituted by an N-imido group. <P>COPYRIGHT: (C)2009,JPO&INPIT |
