发明名称 CHARGED PARTICLE BEAM EQUIPMENT AND CHARGED PARTICLE MICROSCOPY
摘要 On the basis of a displacement of the field of view before and after a deflection of a charged particle beam, extracted from a first specimen image, including a displacement of the field of view recorded by causing a charged particle beam to deflect by a predetermined amount by a beam deflector in an image in which a specimen image is captured at a first magnification calibrated by using a specimen enlarged image of a specimen as a magnification standard, and also a displacement of the field of view before and after a deflection of the charged particle beam, extracted from a second specimen image, including a displacement of the field of view recorded by causing a charged particle beam to deflect by the predetermined amount by the beam deflector in an image in which a specimen image is captured at a second magnification, the second magnification is calibrated.
申请公布号 US2009084955(A1) 申请公布日期 2009.04.02
申请号 US20080234096 申请日期 2008.09.19
申请人 HITACHI HIGH-TECHNOLOGIES CORPORATION 发明人 INADA HIROMI;SATO MITSUGU;TAKANE ATSUSHI
分类号 G01N23/00 主分类号 G01N23/00
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