发明名称 |
PROCESS AND DEPOSITION SYSTEM FOR THIN FILM FORMATION WITH GAS DELIVERY HEAD HAVING SPATIAL SEPARATION OF REACTIVE GASES AND MOVEMENT OF THE SUBSTRATE PASSED THE DELIVERY HEAD |
摘要 |
<p>A process for depositing a thin film material on a substrate is disclosed, comprising simultaneously directing a series of gas flows from the output face of a delivery head of a thin film deposition system toward the surface of a substrate, and wherein the series of gas flows comprises at least a first reactive gaseous material, an inert purge gas, and a second reactive gaseous material, wherein the first reactive gaseous material is capable of reacting with a substrate surface treated with the second reactive gaseous material. A system capable of carrying out such a process is also disclosed.</p> |
申请公布号 |
WO2009042147(A1) |
申请公布日期 |
2009.04.02 |
申请号 |
WO2008US11065 |
申请日期 |
2008.09.24 |
申请人 |
EASTMAN KODAK COMPANY;LEVY, DAVID HOWARD;KERR, ROGER STANLEY;CAREY, JEFFREY TODD |
发明人 |
LEVY, DAVID HOWARD;KERR, ROGER STANLEY;CAREY, JEFFREY TODD |
分类号 |
C23C16/455;C23C16/458 |
主分类号 |
C23C16/455 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|