RADIATION-SENSITIVE COMPOSITION

摘要

Disclosed is a radiation-sensitive composition containing a polymer (A) having a repeating unit (1) represented by the general formula (1) below and a repeating unit (2) represented by the general formula (2) below, and a radiation-sensitive acid generator (B). This radiation-sensitive composition enables to form a resist film which is excellent not only in resolution, but also in pattern collapse resistance and defectiveness, while having low LWR and good PEB temperature dependence. (In the general formula (1) and the general formula (2), R1's independently represent a methyl group or the like; R2 represents a linear or branched alkyl group having 1-12 carbon atoms or the like; R3 represents a linear or branched alkyl group having 1-4 carbon atoms; and n represents an integer of 1-5.)