发明名称 |
COMPOSITION AND METHOD FOR POLISHING A SAPPHIRE SURFACE |
摘要 |
An improved composition and method for polishing a sapphire surface is disclosed. The method comprises abrading a sapphire surface, such as a C-plane or R-plane surface of a sapphire wafer, with a polishing slurry comprising an abrasive amount of an inorganic abrasive material such as colloidal silica suspended in an aqueous medium having a salt compound dissolved therein. The aqueous medium has a basic pH and includes the salt compound in an amount sufficient to enhance the sapphire removal rate relative to the rate achievable under the same polishing conditions using a the same inorganic abrasive in the absence of the salt compound. |
申请公布号 |
WO2006115581(A3) |
申请公布日期 |
2009.04.02 |
申请号 |
WO2006US07518 |
申请日期 |
2006.03.02 |
申请人 |
CABOT MICROELECTRONICS CORPORATION;CHERIAN, ISAAC;DESAI, MUKESH;MOEGGENBORG, KEVIN |
发明人 |
CHERIAN, ISAAC;DESAI, MUKESH;MOEGGENBORG, KEVIN |
分类号 |
B24B1/00;B24B37/04;C09K13/00 |
主分类号 |
B24B1/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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