发明名称 MASKLESS EXPOSURE DEVICE, AND EXPOSURE METHOD OF MASKLESS EXPOSURE DEVICE
摘要 <P>PROBLEM TO BE SOLVED: To provide a maskless exposure device which has high resolving power and superior practicability with relatively simple and inexpensive constitution although requiring no mask, and to provide an exposure method of the maskless exposure device. <P>SOLUTION: The maskless exposure device includes: a light source; a beam brancher which branches light from the light source into first light and second light; a first spatial optical modulator which spatially modulates the intensity distribution of the first light to form a desired image; a second spatial optical modulator which spatially modulates the intensity distribution of the second light to form a desired image; a beam synthesizing element which synthesizes the first light and second light; a projection optical system which projects the synthesized light on a predetermined projection surface; and a control section which supplies modulated signals of the first spatial optical modulator and second spatial optical modulator, the maskless exposure device is characterized in that a first projection image and a second projection image which are formed by the first spatial optical modulator and second spatial optical modulator and projected on the projection surface, are formed at nearly the same places and are exposed while at least a part of them has a relative phase difference of a nearly half wavelength. <P>COPYRIGHT: (C)2009,JPO&INPIT
申请公布号 JP2009071116(A) 申请公布日期 2009.04.02
申请号 JP20070239136 申请日期 2007.09.14
申请人 RICOH CO LTD 发明人 SEO MANABU;NAKAGAWA ATSUSHI;YAMADA YASUSHI
分类号 H01L21/027 主分类号 H01L21/027
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