| 摘要 |
A ZnO vapor deposition material for use in the deposition of, e.g., a transparent conductive film. It consists mainly of a porous ZnO sinter which contains one or more first additive elements selected among Ce, La, Y, Pr, Nd, Pm, and Sm and one or more second additive elements selected among Al, Ga, Sc, and B. The content of the first additive elements is higher than that of the second additive elements, and the content of the first additive elements and the content of the second additive elements are in the ranges of 0.1-14.9 mass% and 0.1-10 mass%, respectively. The sinter has a porosity of 3-50%. |
