RESIN COMPOSITION FOR FORMATION OF FINE PATTERN, AND METHOD FOR FORMATION OF FINE PATTERN

摘要

Disclosed is a resin composition which enables the smooth shrinkage of a resist pattern by heat treatment and can be removed readily by the treatment with an aqueous alkali solution. Specifically disclosed is a resin composition for forming a fine pattern, which is intended to be used for making a fine resist pattern and comprises a resin, a crosslinking component and an alcohol solvent, wherein the resin has a repeating unit (I) having a side chain represented by the formula (1), a repeating unit (II) having a hydroxy group as a side chain and a repeating unit (III) that is a styrene derivative. (1) wherein R, R' and R'' independently represent a hydrogen atom, an alkyl group having 1 to 10 carbon atoms, a hydroxymethyl group, a trifluoromethyl group, or a phenyl group; A represents a single bond, an oxygen atom, a carbonyl group, a carbonyloxy group, or an oxycarbonyl group; B represents a single bond, or a bivalent organic group having 1 to 20 carbon atoms; Rf represents a linear or branched alkyl group having 1 to 8 carbon atoms in which at least one hydrogen atom is substituted by a fluorine atom.