| 摘要 |
PROBLEM TO BE SOLVED: To suppress reduction of a yield of substrate manufacture caused by generation of particles or mist while attaining a high-speed coating operation. SOLUTION: A coating apparatus 1 includes a transportation section 2 for transporting a substrate 90, a support section 5 having a support stage (substrate supporting means) 50 for supporting the substrate 90 from its lower side, a coating section 4 for coating the substrate 90 by discharging a resist (coating solution) from a nozzle 40 onto the substrate, a maintenance section 6 for performing maintenance operation over the nozzle 40, and a control section 8 for controlling the sections of the coating apparatus 1. The support section 5 includes the support stage 50 located between an upstream-side transportation roller 20 and a downstream-side transportation roller 21, a gas exhaust unit 51 and a gas supply unit 52 connected via a pipe not shown to the support stage 50, and a support stage elevating unit (retracting means) 53 for obliquely moving up or down the support stage 50. COPYRIGHT: (C)2009,JPO&INPIT
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