METHOD FOR FORMING CONDUCTIVE FILM PATTERN

摘要

PROBLEM TO BE SOLVED: To provide a method for forming a conductive film pattern which can form a micro conductive film pattern accurately without using a deposition process in a vacuum or a photolithography method. SOLUTION: After a wettability pattern comprising a high wettability region which is high in wettability relative to an ink for a conductive film and a low wettability region having low wettability is formed on a substrate, the ink for the conductive film is coated by an ink jet system to form the conductive film on the high wettability region. COPYRIGHT: (C)2009,JPO&INPIT