发明名称 POLISHING COMPOSITION AND METHOD UTILIZING ABRASIVE PARTICLES TREATED WITH AN AMINOSILANE
摘要 The inventive method comprises chemically-mechanically polishing a substrate with an inventive polishing composition comprising a liquid carrier and abrasive particles that have been treated with a compound.
申请公布号 WO2009042073(A2) 申请公布日期 2009.04.02
申请号 WO2008US10897 申请日期 2008.09.19
申请人 CABOT MICROELECTRONICS CORPORATION 发明人 GRUMBINE, STEVEN;LI, SHOUTIAN;WARD, WILLIAM;SINGH, PANKAJ;DYSARD, JEFFREY
分类号 C09G1/02;C09K3/14 主分类号 C09G1/02
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