<p>A method of etching a metal by a reactive ion etching process is provided. The etchant gas chemistry for the reactive ion etching process consists essentially of NH3. The process is particularly suitable for etching superalloys, which etch only slowly using conventional metal etching techniques.</p>
申请公布号
WO2009039552(A1)
申请公布日期
2009.04.02
申请号
WO2007AU01425
申请日期
2007.09.26
申请人
SILVERBROOK RESEARCH PTY LTD;MCREYNOLDS, DARRELL, LARUE;LAKSHMI, C., S.;SILVERBROOK, KIA
发明人
MCREYNOLDS, DARRELL, LARUE;LAKSHMI, C., S.;SILVERBROOK, KIA
