发明名称 METHOD AND DEVICE FOR INSPECTING MASK, AND METHOD OF MANUFACTURING ELECTROOPTICAL DEVICE
摘要 PROBLEM TO BE SOLVED: To provide a method and device for inspecting a mask which enables the easy detection of a microcrack or strain, and to provide a method of manufacturing an electrooptical device. SOLUTION: The method includes a step of arranging a mask 1 and a glass substrate 12 in opposed relationship through a gap and transmitting monochromatic light through the glass substrate 12 to irradiate the mask 1 with it, and a step of discriminating the quality of the mask 1 on the basis of the interference fringe pattern formed between the mask 1 and the glass substrate 12. COPYRIGHT: (C)2009,JPO&INPIT
申请公布号 JP2009068872(A) 申请公布日期 2009.04.02
申请号 JP20070235048 申请日期 2007.09.11
申请人 SEIKO EPSON CORP 发明人 YOTSUYA SHINICHI
分类号 G01N21/956 主分类号 G01N21/956
代理机构 代理人
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