| 摘要 |
<p>A method of patterning a mesoporous nano particulate layer on a conductive substrate comprises the steps of depositing a pattern on the conductive substrate, depositing a layer of titanium dioxide by atomic layer deposition on the substrate, removing the underlying pattern with a solvent to leave discrete areas of titanium dioxide, depositing a mesoporous nano particulate layer over the whole substrate, and depositing a second layer of titanium dioxide by atomic layer deposition above the mesoporous nano particulate layer whereby the areas of mesoporous nano particulate layer and second titanium dioxide layer over the areas where the first layer of titanium dioxide was removed with the solvent fall off, leaving the patterned mesoporous nano particulate layer.</p> |
