| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a method for diminishing impurities contained in an organic polymer resin in a simple and easy way after the organic polymer resin is patterned and cured on a substrate and part of the organic polymer resin constituting the resulting pattern is evaporated by a chemical reaction. <P>SOLUTION: The method for diminishing impurities is characterized in that after part of the organic polymer resin patterned and cured on the substrate is evaporation by the chemical reaction, one of the following treatments (1)-(3) is carried out to diminish impurities contained in the organic polymer resin; (1) heat treatment at ≥100°C, (2) washing with a basic aqueous solution and (3) washing with an acidic aqueous solution. <P>COPYRIGHT: (C)2009,JPO&INPIT |
