| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an immersion exposure apparatus that prevents the occurrence of defects in products caused by static electricity while having a small alignment error and a small focus error. <P>SOLUTION: An exposure apparatus exposes a substrate 40 via liquid LW supplied between a lens, closest to the substrate 40, of a projection system 30 and the substrate 40. The liquid LW includes a compound containing carbon and hydrogen. The exposure apparatus has a first water-vapor addition mechanism 305, which adds first water vapor to gas, not including oxygen, supplied around the liquid LW existing between the substrate 40 and the lens, and a second water-vapor addition mechanism 501 that adds second water vapor to gas inside a chamber 401 including an optical path for light used in a ranging device for measuring a position of the substrate 40. <P>COPYRIGHT: (C)2009,JPO&INPIT |
