发明名称 OPTICAL INTEGRATOR, ILLUMINATION OPTICAL SYSTEM, EXPOSURE APPARATUS AND DEVICE-MANUFACTURING METHOD
摘要 <P>PROBLEM TO BE SOLVED: To provide an optical integrator, capable of uniforming an illumination distribution on an irradiated surface by suppressing the influence due to the difference in surface shape of each refractive surface, when it is applied to, for example, an illumination optical system that illuminates the surface to be illuminated. <P>SOLUTION: The wavefront separating type optical integrator (9) is provided with a plurality of refractive surfaces (9ab, 9bb) disposed one- or two-dimensionally, and at least one diffractive optical surface (9d), formed on a region (9c) between the plurality of refractive surfaces (9bb) adjacent to each other in the plurality of refractive surfaces. <P>COPYRIGHT: (C)2009,JPO&INPIT
申请公布号 JP2009071011(A) 申请公布日期 2009.04.02
申请号 JP20070237453 申请日期 2007.09.13
申请人 NIKON CORP 发明人 TANITSU OSAMU
分类号 H01L21/027;G02B19/00;G03F7/20 主分类号 H01L21/027
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