发明名称 SEMICONDUCTOR FILM FORMING COATING, SEMICONDUCTOR FILM, ELECTRODE FOR PHOTOCELL, ITS MANUFACTURING METHOD, AND PHOTOCELL
摘要 <P>PROBLEM TO BE SOLVED: To provide a semiconductor film forming coating capable of manufacturing a semiconductor film excellent in binding force and dye adsorbing property and high in photocell characteristics; to provide a semiconductor film excellent in binding force and dye adsorbing property and high in photocell characteristics; and to provide an electrode for photocell high in photocell characteristics. <P>SOLUTION: The semiconductor film forming coating contains zinc oxide particles, a binder containing emulsion resin and a solvent. The semiconductor film 13 contains zinc oxide particles, a binder containing emulsion resin and dye. An electrode 10 has a transparent substrate 11, a transparent conductive film 12 formed on one side or both sides of the transparent substrate 11, and the semiconductor film 13 formed on the opposite surface to the transparent substrate 11 of the transparent film 12. <P>COPYRIGHT: (C)2009,JPO&INPIT
申请公布号 JP2009070783(A) 申请公布日期 2009.04.02
申请号 JP20070241059 申请日期 2007.09.18
申请人 TOMOEGAWA PAPER CO LTD 发明人 SUZUKI TOSHIYASU;MATSUMOTO KOICHI;KONNO AKINORI
分类号 H01M14/00;C09D5/02;C09D5/24;C09D7/12;C09D109/00;C09D109/04;C09D109/08;H01L31/04 主分类号 H01M14/00
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