发明名称 METHOD FOR FEATURE PREDICTION, METHOD FOR MANUFACTURING PHOTOMASK, METHOD FOR MANUFACTURING ELECTRONIC COMPONENT, AND PROGRAM FOR FEATURE PREDICTION
摘要 A method for feature prediction, determining an incident angle at an incident amount prediction point on basis of a pattern data, determining an incident amount at the incident amount prediction point on basis of the incident angle and a process condition data, determining an incident amount distribution on basis of the incident amount at a plurality of the incident amount prediction points, selecting a feature prediction point on basis of the incident amount distribution and a predetermined threshold or a manufacturing history data, and performing prediction of a feature at the selected feature prediction point.
申请公布号 US2009087757(A1) 申请公布日期 2009.04.02
申请号 US20080238795 申请日期 2008.09.26
申请人 KABUSHIKI KAISHA TOSHIBA 发明人 ONOUE SEIJI
分类号 G03F1/36;G03F1/68;G03F1/70;G03F7/20;G06F17/50;H01L21/027 主分类号 G03F1/36
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