| 摘要 |
A substrate treating apparatus for treating substrates with treating liquids includes a treating tank for storing the treating liquids and receiving the substrates, a holding mechanism movable, while holding the substrates, between a treating position inside the treating tank and an upper position above the treating tank, a first supply device for supplying deionized water into the treating tank, a second supply device for supplying a water-soluble organic solvent in liquid form into the treating tank, a third supply device for supplying a water-insoluble organic solvent in liquid form into the treating tank, and a controller. With the holding mechanism having moved the substrates to the treating position, the controller carries out a deionized water cleaning process to clean the substrates by supplying the deionized water from the first supply device into the treating tank, treats the substrates with the water-soluble organic solvent by supplying the water-soluble organic solvent from the second supply device into the treating tank to replace the deionized water in the treating tank with the water-soluble organic solvent, treats the substrates with a mixture of the water-soluble organic solvent and water-insoluble organic solvent by supplying the water-soluble organic solvent from the second supply device into the treating tank and supplying the water-insoluble organic solvent from the third supply device into the treating tank, and thereafter moves the holding mechanism to the upper position.
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