| 摘要 |
PROBLEM TO BE SOLVED: To provide a device for treating substrates, with which the device can be small sized and suppress throughput even when untreated substrate needs to be moved back and forth between two chambers. SOLUTION: The device 11 for treating substrates includes the first chamber 15 with vacuum atmosphere and the second chamber 16 with nitrogen atmosphere. Since the first chamber 15 and the second chamber 16 have planar regular octagon shapes, when one side of each, 15a and 16a are arranged to be facing to each other, two areas A and B opening at 90°exist between the first chamber 15 and the second chamber 16. Further, in these areas A and B, the first connection room 41 and the second connection room 42, which can be communicated to the first chamber 15 and the second chamber 16 and store a multiple number of untreated substrates 12, are arranged. COPYRIGHT: (C)2009,JPO&INPIT
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