发明名称 |
WAFER BOW METROLOGY ARRANGEMENTS AND METHODS THEREOF |
摘要 |
<p>An arrangement for quantifying a wafer bow. The arrangement is positioned within a plasma processing system is provided. The arrangement includes a support mechanism for holding a wafer. The arrangement also includes a first set of sensors, which is configured to collect a first set of measurement data for a plurality of data points on the wafer. The first set of measurement data indicates a minimum gap between the first set of sensors and the wafer. The first set of sensors is positioned in a first location, which is outside of a set of process modules of the plasma processing system.</p> |
申请公布号 |
WO2009042997(A2) |
申请公布日期 |
2009.04.02 |
申请号 |
WO2008US78110 |
申请日期 |
2008.09.29 |
申请人 |
LAM RESEARCH CORPORATION;BAILEY, ANDREW D., III |
发明人 |
BAILEY, ANDREW D., III |
分类号 |
H01L21/68;H01L21/20;H01L21/30 |
主分类号 |
H01L21/68 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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