| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a method for forming a stripe pattern by using a photosensitive material, in which discontinuity in the stripe pattern due to foreign matter existing on or in a photosensitive material layer is prevented. <P>SOLUTION: The method forms a stripe pattern by exposing the photosensitive material layer to light through a photomask having a light transmitting portion in stripes while changing an incident angle of the light to the photosensitive material, and developing. In the method, the incident angle of the exposure light is changed while the incident direction of the light is kept approximately perpendicular to a width direction of the stripe pattern. Otherwise, the method forms a stripe pattern by exposing twice or more and developing. In the two or more exposure steps, the light used for the all exposure steps is controlled to be approximately perpendicular to the width direction of the stripe pattern, and the incident angle of the light to the photosensitive material in at least one exposure step is controlled to be different from the incident angle of light to the photosensitive material layer in the other exposure step. <P>COPYRIGHT: (C)2009,JPO&INPIT |
