| 摘要 |
PROBLEM TO BE SOLVED: To provide a film-forming apparatus which can improve film quality and film thickness controllability by stabilizing a pre-sputtering process, and to provide a film-forming method. SOLUTION: A shutter sheet 15 includes: a shielding face 15U which is provided in between a target 18 and the shutter sheet 15 in a rotating path R and shields the target 18; and a recess part 15B which is provided in between the target 18 and the shutter sheet 15 in the rotating path R and is recessed towards a substrate S side. The shutter sheet 15 makes the recess part 15B face to the target 18 when the target 18 is pre-sputtered, and makes its aperture 15A face to the target 18 when the target 18 is seriously sputtered. COPYRIGHT: (C)2009,JPO&INPIT
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