发明名称 STRUCTURE AND METHOD FOR DETERMINING AN OVERLAY ACCURACY
摘要 An enhanced technique for determination of an alignment accuracy involves an overlay target assembly which comprises at least two targets, each target having a first sub-structure of a first layer and a second sub-structure of a second layer, wherein, when the first layer and the second layer are correctly aligned, the first sub-structure and the second sub-structure of at least one of the targets are offset with respect to each other by a programmed offset and the overlay target assembly is invariant to at least one geometric transformation. If the offset vectors which describe the offset between the first sub-structure and the second sub-structure all have the same norm, the overlay error may be determined without calibration. Redundancy may be increased by providing each target with two or more programmed offsets between elements of the first sub-structure and elements of the second sub-structure.
申请公布号 US2009087756(A1) 申请公布日期 2009.04.02
申请号 US20080101439 申请日期 2008.04.11
申请人 SCHULZ BERND 发明人 SCHULZ BERND
分类号 G03F1/00 主分类号 G03F1/00
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