| 摘要 |
An X-ray diffraction measuring apparatus equipped with Debye-Scherrer optical system therein, comprises a means for generating a characteristic X-ray to be irradiated upon a sample to be measured; an X-ray detector means being disposed to surround that sample around; and a focusing means, being disposed between the sample and the X-ray detector means, for collecting an X-ray scattering from the sample covering over a predetermined angle, in a peripheral direction, around the sample, and thereby irradiating it upon the X-ray detector means.
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