发明名称 STRUCTURAL BODY AND MANUFACTURING METHOD THEREOF
摘要 The present invention includes a substrate structural body having a high electrostatic chuck force at a low voltage even when an insulated board is used, and a method for manufacturing the substrate structural body. As the substrate structural body, there is provided a substrate structural body for attaining its fixing by an electrostatic chuck mechanism, comprising at least a first polycrystalline silicon film formed on the back surface of a substrate comprised of an insulating material or its back and side surfaces, wherein a top layer of part of the back surface or the back and side surfaces is of a first silicon insulating film.
申请公布号 US2009085174(A1) 申请公布日期 2009.04.02
申请号 US20080210259 申请日期 2008.09.15
申请人 NODA SHUICHI;SHIMOKAWA KIMIAKI 发明人 NODA SHUICHI;SHIMOKAWA KIMIAKI
分类号 H01L23/58;H01L21/36 主分类号 H01L23/58
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