发明名称 |
A BARRIER LAYER FOR A PROCESSING ELEMENT AND A METHOD OF FORMING THE SAME |
摘要 |
In order to mitigate erosion of exposed processing elements in a processing system by the process and any subsequent contamination of the substrate in the processing system, processing elements exposed to the process are coated with a protective barrier. The protective barrier comprises a protective layer that is resistant to erosion by the plasma, and a bonding layer that improves the adhesion of the protective layer to the processing element to mitigate possible process contamination by failure of the protective layer. |
申请公布号 |
WO2004095532(A3) |
申请公布日期 |
2009.04.02 |
申请号 |
WO2004US06080 |
申请日期 |
2004.03.18 |
申请人 |
TOKYO ELECTRON LIMITED;ESCHER, GARY;ALLEN, MARK, A. |
发明人 |
ESCHER, GARY;ALLEN, MARK, A. |
分类号 |
H01L21/00;H01J37/32;H01L21/31;H01L21/76;H01L29/76 |
主分类号 |
H01L21/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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