发明名称 A BARRIER LAYER FOR A PROCESSING ELEMENT AND A METHOD OF FORMING THE SAME
摘要 In order to mitigate erosion of exposed processing elements in a processing system by the process and any subsequent contamination of the substrate in the processing system, processing elements exposed to the process are coated with a protective barrier. The protective barrier comprises a protective layer that is resistant to erosion by the plasma, and a bonding layer that improves the adhesion of the protective layer to the processing element to mitigate possible process contamination by failure of the protective layer.
申请公布号 WO2004095532(A3) 申请公布日期 2009.04.02
申请号 WO2004US06080 申请日期 2004.03.18
申请人 TOKYO ELECTRON LIMITED;ESCHER, GARY;ALLEN, MARK, A. 发明人 ESCHER, GARY;ALLEN, MARK, A.
分类号 H01L21/00;H01J37/32;H01L21/31;H01L21/76;H01L29/76 主分类号 H01L21/00
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