| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a method for manufacturing a metal pattern material suitable for manufacturing a light-shielding material such as a photomask and having high smoothness of the surface, and to provide a metal pattern material obtained by the above method. <P>SOLUTION: The method for manufacturing a metal pattern material includes the steps of: (A) forming a polymer layer comprising a polymer on a glass substrate, the polymer having a functional group capable of forming an interaction with metal particles or a functional group capable of forming an interaction with a metal ion or a metal salt, as well as having at least one molecular end directly chemically bonded to the glass substrate; and (B) forming a resist pattern on the polymer layer and patterning a region containing metal particles in the polymer layer in a region where the resist pattern is formed or a region where the resist pattern is not formed. The metal pattern material is obtained by the above manufacturing method. <P>COPYRIGHT: (C)2009,JPO&INPIT |
