| 摘要 |
PROBLEM TO BE SOLVED: To provide a film-forming device for simultaneously performing double-sided film formation on a large number of substrates in short time. SOLUTION: A film-forming device 10 comprises a film-forming chamber 1 provided with gas discharge means 3, gas introduction means 2 for introducing film-forming gas into a film-forming chamber, and a partition member 15 which surrounds the side of a substrate group of one or more substrates S1 to S3 which are held in such a manner that they stand along a perpendicular direction and whose upper surface and lower surface are opened. The gas introduction means and the partition member are arranged so that the film-forming gas is introduced into a space 16 surrounded by the partition member. COPYRIGHT: (C)2009,JPO&INPIT
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