发明名称 TFT ARRAY INSPECTION METHOD AND TFT ARRAY INSPECTING DEVICE
摘要 PROBLEM TO BE SOLVED: To specify a defective point on a short line defect, in a TFT array inspection. SOLUTION: A TFT substrate inspection method inspects defects of a TFT array, by applying a voltage on the TFT array of a TFT substrate and detecting secondary electrons obtained by electron beam irradiation. The inspection method includes a line defect detection process for detecting the presence of line defects by applying a first inspection signal on the TFT substrate; a defective point detection process for detecting presence of a defective point, by applying a second inspection signal having a signal pattern different from the first inspection signal on the TFT substrate; a defective point extraction process for comparing the position of the line defect and the position of the defective point, and extracting the defective point on the line defect, as a defective point of the short-line defect. By changing the signal pattern of the inspection signal applied to the TFT substrate, line defect detection and defective point detection can be conducted through switching. It is determined whether the defect position detected by the defective point detection is located inside a detection position detected in the line defect detection by comparing positional coordinates. COPYRIGHT: (C)2009,JPO&INPIT
申请公布号 JP2009069408(A) 申请公布日期 2009.04.02
申请号 JP20070236970 申请日期 2007.09.12
申请人 SHIMADZU CORP 发明人 HATAJIMA HIROKI
分类号 G09F9/00;G01R31/00;G01R31/02;G02F1/13 主分类号 G09F9/00
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