| 发明名称 |
LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD |
| 摘要 |
<P>PROBLEM TO BE SOLVED: To enable an effective control of optical performance of an immersion lithographic projection system. <P>SOLUTION: An immersion lithographic apparatus includes a lens having optical properties which can be adjusted by an adjusting device formed from an immersion liquid filled up between a final element of the projection system and a substrate. The adjusting device is arranged to adjust the properties of the liquid lens such as the shape, composition, refractive index or absorption index as a function of space or time in order to change the imaging performance of the immersion lithographic apparatus. <P>COPYRIGHT: (C)2009,JPO&INPIT |
| 申请公布号 |
JP2009071316(A) |
申请公布日期 |
2009.04.02 |
| 申请号 |
JP20080274669 |
申请日期 |
2008.10.24 |
| 申请人 |
ASML NETHERLANDS BV;CARL ZEISS SMT AG |
发明人 |
MULKENS JOHANNES CATHARINUS HUBERTUS;BASELMANS JOHANNES JACOBUS MATHEUS;GRAEUPNER PAUL;LOOPSTRA ERIK ROELOF;STREEFKERK BOB |
| 分类号 |
H01L21/027;G02B3/14;G02B21/33;G03F7/20;H01L21/683 |
主分类号 |
H01L21/027 |
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