发明名称 Structure for storing a substrate and semiconductor manufacturing apparatus
摘要 The present invention provides a structure for storing a substrate that can be downsized compared to conventional techniques and is capable of suppressing an increase in footprint. The structure for storing a substrate pertaining to the present invention includes a holding section for holding a substrate horizontally, an inner component positioned around the holding section, which has a loading and unloading section for loading and unloading the substrate from the holding section in a horizontal direction, and an outer component positioned around the inner component, which has an opening corresponding to the loading and unloading section, wherein the inner component and the outer component are able to rotate independently of each other and a rotation axis of the inner component and a rotation axis of the outer component are orthogonal to a face of the substrate.
申请公布号 US2009087289(A1) 申请公布日期 2009.04.02
申请号 US20080284095 申请日期 2008.09.17
申请人 TOKYO ELECTRON LIMITED 发明人 OSADA SHIN
分类号 B65H1/04;B65G1/12 主分类号 B65H1/04
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