| 摘要 |
Disclosed is a positive-type photosensitive resin composition comprising: a resin which has a specific acrylic acid-type constituent unit whose dissociating group can be dissociated to produce a carboxyl group, which is insoluble or poorly soluble in an alkali, and whose acid-dissociating group can be dissociated to render the resin alkali-soluble; a resin which has a constituent unit having a functional group capable of reacting with a carboxyl group to form a covalent bond; and a compound which can generate an acid upon being irradiated with an active ray or an radioactive ray. The positive-type photosensitive resin composition is excellent in sensitivity, percentage residual film and storage stability. Also disclosed is a cured film produced by a cured film formation method using the positive-type photosensitive resin composition. The cured film is excellent in heat resistance, an adhesion property, transmittance and the like. |
