| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a patterning process capable of effectively preventing a first positive resist pattern from being dissolved in a resist solvent and a developer, and ensures good double patterning, and a pattern surface coating material used for implementing this process. <P>SOLUTION: The patterning process includes: forming a resist film on a substrate with a positive resist material having a polymer compound having recurring units which become alkali soluble under the action of acid; heat treating; exposing; developing to form a first resist pattern; applying a pattern surface coating material having a solution of a hydroxyl-containing crosslinkable polymer compound onto the first resist pattern and crosslinking, thereby covering the first resist pattern with a crosslinked film of the polymer compound; applying a second positive resist material thereon; exposing; and developing to form a second resist pattern. <P>COPYRIGHT: (C)2009,JPO&INPIT |
